high-tech business established with a goal of becoming the world’s premier solution for reliability and noise assessment/analysis.
Korea Sensor Lab.
Blanket Wafer Service
- Test Wafer service to test new material, process, and process equipment.
- ALD Films : HfO2, HfSiO2, SiN, SiO2, Ta2O5, Al2O3, etc
- Sputter Films : Ti, TiN, Co, Ni, Pd, Ta, W, Al, Pt, Pd, Hf, HfO2, etc
Patterned Wafer Service
- Provide patterned wafers (~ nm) to test material, process, and process equipment in nano-scale range
- Provide Patterned Wafers with Specific structures what Customer wants through international networking.
ALD(Atomic Layer Deposition) 증착
- Thickness control with a accuracy about 1 Å is necessary for gate dielectric along with the scale down of semiconductor devices.
- Various kinds of dielectric films are available.
- Deposition of various kinds of films using Magnetron (RF/DC) sputter under ultra low pressure (1x10-7torr)
- Co-sputtering of two or three materials concurrently
- Sequential sputtering with 4 kinds of films without breaking the vacuum
- Dry and wet oxidation of SiO2
- Activation of ion implanted dopant and recovery of damaged lattice
- Analysis of the temperature dependence of fabricated device or films at high temperature
- Rapid Thermal Process (RTP)/Rapid Thermal Oxidation (RTO) process up to 1000℃
- Formation of various silicide such as Nickel silicide
- Furnace annealing under N2, O2 or H2 Forming Gas ambient.
High Temperature/High Pressure Annealing
- High pressure annealing to improve the film and/or device performance using high temperature and/or high pressure annealing.
- High pressure annealing under N2 or H2 Forming Gas ambient.
- Formation of find patterns for dielectric or metal films