high-tech business established with a goal of becoming the world’s premier solution for reliability and noise assessment/analysis.
Korea Sensor Lab.


    Blanket Wafer Service

    • Test Wafer service to test new material, process, and process equipment.
    • ALD Films : HfO2, HfSiO2, SiN, SiO2, Ta2O5, Al2O3, etc
    • Sputter Films : Ti, TiN, Co, Ni, Pd, Ta, W, Al, Pt, Pd, Hf, HfO2, etc

    Patterned Wafer Service

    • Provide patterned wafers (~ nm) to test material, process, and process equipment in nano-scale range
    • Provide Patterned Wafers with Specific structures what Customer wants through international networking.

    ALD(Atomic Layer Deposition) 증착

    • Thickness control with a accuracy about 1 Å is necessary for gate dielectric along with the scale down of semiconductor devices.
    • Various kinds of dielectric films are available.

    Sputter Deposition

    • Deposition of various kinds of films using Magnetron (RF/DC) sputter under ultra low pressure (1x10-7torr)
    • Co-sputtering of two or three materials concurrently
    • Sequential sputtering with 4 kinds of films without breaking the vacuum


    • Dry and wet oxidation of SiO2

    Furnace/RTP Annealing

    • Activation of ion implanted dopant and recovery of damaged lattice
    • Analysis of the temperature dependence of fabricated device or films at high temperature
    • Rapid Thermal Process (RTP)/Rapid Thermal Oxidation (RTO) process up to 1000℃
    • Formation of various silicide such as Nickel silicide
    • Furnace annealing under N2, O2 or H2 Forming Gas ambient.

    High Temperature/High Pressure Annealing

    • High pressure annealing to improve the film and/or device performance using high temperature and/or high pressure annealing.
    • High pressure annealing under N2 or H2 Forming Gas ambient.


    • Formation of find patterns for dielectric or metal films